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International Journal of New Technology and Research

Impact Factor 3.953

(An ISO 9001:2008 Certified Online Journal)
India | Germany | France | Japan

Planar Reactive Magnetron Sputtering to Obtain Dielectrics and Transparent Conductive Thin Films

( Volume 6 Issue 6,June 2020 ) OPEN ACCESS

Marina Kipiani


Magnetron, reactive, sputtering, dielectrics, target, films.


The design and technological capabilities of the innovative planar magnetron sputtering device (PMSD) with a rotating magnetic unit are considered. Namely, technological capabilities for obtaining modern materials,  such as dielectric and transparent conductive thin films. The article describes innovative approaches to solving such problems that are associated with reactive sputtering, and it is difficult to solve them under the conditions of stationary magnetron sputtering. The main advantages of the rotating magnetron device developed by us are: The compactness of the device, the effective cooling of the spray target, and the cathode assembly as a whole, as well as the use of a cooling system to set the magnetic unit in motion. The rotation of the magnetic system under the atomized round target cathode provides synchronous movement of a closed magnetic field along its surface; By adjusting the distance between the permanent magnets of the opposite poles and the configuration of their location, you can change the configuration of the magnetic field on the target surface. This allows you to adjust the distribution of the intensity of ion bombardment on the surface of the target. In turn, this, together with the regulation of the rotation speed of the magnetic system, opens up new possibilities for controlling the technological regimes of reactive sputtering; provides flatness of the bottom of the sprayed target and high uniformity in the composition of thin dielectric and transparent conductive films. These design features can significantly improve the technical characteristics of a planar magnetron and apply it to solve a wide range of reactive sputtering problems from applying high-quality, required coatings to obtaining uniform high-quality dielectric and transparent conductive thin films.


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